PROXIMITY CORRECTION METHOD AND SYSTEM

A proximity correction method includes creating a first proximity correction model having a focus value and creating a second proximity correction model having a first defocus value. One of the first or second proximity correction models are associated with corresponding first and second layout area...

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Bibliographische Detailangaben
1. Verfasser:	GRIMM WOLFGANG
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTROGRAPHY HOLOGRAPHY PHOTOGRAPHY PHYSICS
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Beschreibung
Zusammenfassung:	A proximity correction method includes creating a first proximity correction model having a focus value and creating a second proximity correction model having a first defocus value. One of the first or second proximity correction models are associated with corresponding first and second layout areas of a semiconductor wafer.