Method for Compensating for Variations in Structures of an Integrated Circuit

Method for Compensating for Variations in Structures of an Integrated Circuit

A method of for compensating for variations in structures of an integrated circuit. The method includes (a) selecting a mask design shape and selecting a region of the mask design shape; (b) applying a model-based optical proximity correction to all of the mask design shape; and after (b), (c) apply...

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Bibliographische Detailangaben
Hauptverfasser: STAMPER ANTHONY K, LEIDY ROBERT KENNETH, PASTEL PAUL WILLIAM, HULVEY MICHAEL D, PORTH BRUCE WALTER, CREDENDINO SANTO, KUPPUSAMY JOTHIMALAR
Format: Patent
Sprache:eng
Schlagworte:
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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Beschreibung
Zusammenfassung:A method of for compensating for variations in structures of an integrated circuit. The method includes (a) selecting a mask design shape and selecting a region of the mask design shape; (b) applying a model-based optical proximity correction to all of the mask design shape; and after (b), (c) applying a rules-based optical proximity correction to the selected region of the mask design shape.