SYSTEM-IN-PACKAGE WITH THROUGH SUBSTRATE VIA HOLES

The present invention relates to a system-in-package that comprises an integration substrate with a thickness of less than 100 micrometer and a plurality of through-substrate vias, which have an aspect ratio larger than 5. A first chip is attached to the integration substrate and arranged between th...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: YANNOU JEAN-MARC, DEKKER RONALD, VAN VEEN NICOLAAS J. A
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention relates to a system-in-package that comprises an integration substrate with a thickness of less than 100 micrometer and a plurality of through-substrate vias, which have an aspect ratio larger than 5. A first chip is attached to the integration substrate and arranged between the integration substrate and a support, which is suitable for mechanically supporting the integration substrate during processing and handling. The system-in-package can be fabricated according to the invention without a through-substrate-hole etching step. The large aspect ratio implies reduced lateral extensions, which allow increasing the integration density and decreasing lead inductances.