METHOD FOR PRODUCING A COATING BY ATMOSPHERIC PRESSURE PLASMA TECHNOLOGY

A method of coating a substrate includes: providing a substrate (1), producing an atmospheric pressure plasma discharge in the presence of a gas, at least partially exposing the substrate to the atmospheric pressure plasma discharge. The method also includes introducing a liquid aerosol (6) of coati...

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Bibliographische Detailangaben
Hauptverfasser:	WASBAUER INGRID, VANGENEUGDEN DIRK, ISSARIS ANNA, DUBREUIL MARJORIE
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A method of coating a substrate includes: providing a substrate (1), producing an atmospheric pressure plasma discharge in the presence of a gas, at least partially exposing the substrate to the atmospheric pressure plasma discharge. The method also includes introducing a liquid aerosol (6) of coating forming material into the atmospheric pressure plasma discharge, thereby forming a coating on the substrate, curing the substrate and coating, by exposing the substrate to ultraviolet light.