SEMICONDUCTOR DEVICE, FABRICATION METHOD THEREOF, AND PHOTOMASK

There is provided a semiconductor device including a wafer and a focus monitoring pattern formed on the wafer. The focus monitoring pattern has at least one pair of first and second patterns. The first pattern has an unexposed region surrounded by an exposed region and the second pattern has an expo...

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Bibliographische Detailangaben
Hauptverfasser:	TAKAHARA MIKA, TOYODA SHIGEHIRO, HIGASHI TOHRU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	There is provided a semiconductor device including a wafer and a focus monitoring pattern formed on the wafer. The focus monitoring pattern has at least one pair of first and second patterns. The first pattern has an unexposed region surrounded by an exposed region and the second pattern has an exposed region surrounded by an unexposed region. In addition, the present invention provides a method of fabricating a semiconductor device comprising the steps of forming at least one pair of first and second patterns on a wafer. The first pattern has an unexposed region surrounded by an exposed region and the second pattern has an exposed region surrounded by an unexposed region. The method further comprises checking a focusing condition on exposure by measuring widths of the first and second patterns formed on the wafer.