MECHANICALLY STABLE DIFFUSION BARRIER STACK AND METHOD FOR FABRICATING THE SAME

MECHANICALLY STABLE DIFFUSION BARRIER STACK AND METHOD FOR FABRICATING THE SAME

A mechanically stable diffusion barrier stack structure and method of fabricating the same is disclosed. The fusion barrier stack structure having a molybdenum nitride layer deposited on a molybdenum layer and operates to prevent diffusion between a semiconductor layer and a metal interconnect. The...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SANKUR HALUK, THOMAS MASON
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A mechanically stable diffusion barrier stack structure and method of fabricating the same is disclosed. The fusion barrier stack structure having a molybdenum nitride layer deposited on a molybdenum layer and operates to prevent diffusion between a semiconductor layer and a metal interconnect. The method for fabricating includes depositing a molybdenum layer outwardly from the semiconductor layer in a deposition chamber, and depositing a molybdenum nitride layer outwardly from the molybdenum layer in the deposition chamber.