Lithographic Apparatus and Calibration Method

In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal...

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Hauptverfasser: VAN DER WIJST MARC WILHELMUS MARIA, HAMERS MARTIJN ROBERT, VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS, ANGELIS GEORGO, KLAVER RENATUS GERARDUS, BUTLER HANS, VAN DEN BRINK MARINUS AART, EUSSEN EMIEL JOZEF MELANIE, HOEKSTRA PETER, VERHAAR BOUDEWIJN THEODORUS
Format: Patent
Sprache:eng
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Zusammenfassung:In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal representative of a difference between the setpoint signal and the position of the stage as measured by the sensor head is registered. The stage system is calibrated from the registered signal representative of the difference.