STABLE STRESS DIELECTRIC LAYER
An integrated circuit is provided having a substrate and a transistor in an active region of the substrate. The substrate also has an isolation region having a dielectric material. In one embodiment, a pre-metal dielectric (PMD) layer is disposed over the substrate and the transistor. At least one o...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | An integrated circuit is provided having a substrate and a transistor in an active region of the substrate. The substrate also has an isolation region having a dielectric material. In one embodiment, a pre-metal dielectric (PMD) layer is disposed over the substrate and the transistor. At least one of the isolation region or the PMD layer includes O3-TEOS having a first stress. A cap layer is disposed over the O3-TEOS in the isolation region or the PMD layer. The cap layer prevents degradation of the first stress of the O3-TEOS. |
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