LITHOGRAPHIC APPARATUS AND METHOD

A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.

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Bibliographische Detailangaben
Hauptverfasser:	OTTENS JOOST JEROEN, SIJBEN ANKO JOZEF CORNELUS, VAN ABEELEN HENDRIKUS JOHANNES MARINUS, STEFFENS PAULA, JACOBS JOHANNES HENRICUS WILHELMUS, VAN DER MEULEN FRITS, LEENDERS MARTINUS HENDRIKUS ANTONIUS, MARIA MAAS WOUTERUS JOHANNES PETRUS, VERSTEIJNEN HENRICUS PETRUS
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY PHOTOGRAPHY PHYSICS
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Beschreibung
Zusammenfassung:	A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.