Gas Introducing Apparatus, Manufacturing Method for the Gas Introducing Apparatus and Processing Apparatus

The present invention provides a gas introducing apparatus, which can perform start and stop of supplying a gas at respective gas injection holes, rapidly and simultaneously. A gas introducing apparatus 24 installed in a gas-dischargeable processing vessel 22 includes a gas introducing head 110 conf...

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Bibliographische Detailangaben
1. Verfasser:	HANADA YOSHIYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMBINED OPERATIONS DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE OTHER WORKING OF METAL PERFORMING OPERATIONS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING UNIVERSAL MACHINE TOOLS
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Beschreibung
Zusammenfassung:	The present invention provides a gas introducing apparatus, which can perform start and stop of supplying a gas at respective gas injection holes, rapidly and simultaneously. A gas introducing apparatus 24 installed in a gas-dischargeable processing vessel 22 includes a gas introducing head 110 configured to face the processing vessel. Gas supply passages 12 each configured to flow a supply gas through the gas introducing vessel, exhaust passages 114, control gas passages 116 each configured to flow a control gas, and a plurality of gas injection holes 28 provided in a face of the gas introducing head facing the processing vessel, are provided in the gas introducing head 110. Pure fluid logic elements 118 are provided in the gas introducing head 110, each being in communication with the gas supply passage, exhaust passage and control gas passage, and corresponding to each gas injection hole.