MILLISECOND ANNEALING (DSA) EDGE PROTECTION

A method and apparatus for thermally processing a substrate is provided. A substrate is disposed within a processing chamber configured for thermal processing by directing electromagnetic energy toward a surface of the substrate. An energy blocker is provided to block at least a portion of the energ...

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Bibliographische Detailangaben
Hauptverfasser: KOELMEL BLAKE, MAYUR ABHILASH J, LARMAGNAC DAVID DL, LERNER ALEXANDER N, YUDOVSKY JOSEPH, MCINTOSH ROBERT C
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A method and apparatus for thermally processing a substrate is provided. A substrate is disposed within a processing chamber configured for thermal processing by directing electromagnetic energy toward a surface of the substrate. An energy blocker is provided to block at least a portion of the energy directed toward the substrate. The blocker prevents damage to the substrate from thermal stresses as the incident energy approaches an edge of the substrate.