POSITIVE PHOTOSENSITIVE POLYMER COMPOSITION

A positive photosensitive polymer composition of the invention contains: a copolymer obtained by the radical polymerization of monomers including a radical polymerizable monomer (a1) having a (meth)acryloyl group and a polyalkylene glycol group a terminal of which is an alkoxy group; and a 1,2-quino...

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Bibliographische Detailangaben
Hauptverfasser:	KIMURA YUUKI, ETOU TOMOHIRO, TAKAHASHI TOSHIYUKI, WATANABE EIJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TRANSPORTING
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Beschreibung
Zusammenfassung:	A positive photosensitive polymer composition of the invention contains: a copolymer obtained by the radical polymerization of monomers including a radical polymerizable monomer (a1) having a (meth)acryloyl group and a polyalkylene glycol group a terminal of which is an alkoxy group; and a 1,2-quinone diazide compound. The positive photosensitive polymer composition may further contain a copolymer obtained by the radical polymerization of monomers not including the monomer (a1).