SEMICONDUCTOR MANUFACTURE PERFORMANCE ANALYSIS

A software architecture, design and implementation that enables efficient transistor performance analysis across multiple levels of parameter granularity with interactive drill-down, drill-across capability, for use during semiconductor technology development. The software may include several featur...

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Bibliographische Detailangaben
Hauptverfasser: MURATA TAKAHIRO, DONGRE KEDAR, ZHOU YIQING, ARMSTRONG MARK
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A software architecture, design and implementation that enables efficient transistor performance analysis across multiple levels of parameter granularity with interactive drill-down, drill-across capability, for use during semiconductor technology development. The software may include several features, such as highly modular, robust architecture to enable analysis across the multiple granularity of transistor performance data, i.e., per die, material group, and aggregate, GUI-based template configuration to specify the analysis across the multiple levels in a uniform set of operations, subsystems to execute the template specified with the GUI, integration of pass-fail analysis analytics, interactive drill-down on particular data points of user interest in automatically generated charts, and drill-across capability allowing linking of data points highlighted on a single chart to those that are correlated in all other charts. Other embodiments are described.