Imaging Device in a Projection Exposure Machine

An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part...

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Hauptverfasser: KOHL ALEXANDER, REINER RAOUL, RIEF KLAUS, BACK STEPHAN, SCHWAER BAERBEL, FISCHER JUERGEN, AUBELE KARL-EUGEN, HUMMEL WOLFGANG, SCHOENGART STEFAN, NEUMAIER MARKUS, MERZ ERICH, LIPPERT JOHANNES, RASSEL THORSTEN, MUEHLBEYER MICHAEL, WEBER ULRICH, HOLDERER HUBERT, WEBER JOCHEN
Format: Patent
Sprache:eng
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Zusammenfassung:An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.