Exhaust after-treatment system having a secondary tank
An exhaust after-treatment system having a main tank configured to retain and supply a reductant is disclosed. The exhaust after-treatment system includes a main heat source disposed in the main tank and configured to thaw the reductant. The exhaust after-treatment system also includes a secondary t...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | An exhaust after-treatment system having a main tank configured to retain and supply a reductant is disclosed. The exhaust after-treatment system includes a main heat source disposed in the main tank and configured to thaw the reductant. The exhaust after-treatment system also includes a secondary tank configured to retain a supply of reductant and a pump configured to pass reductant from the secondary tank to the main tank. The exhaust after-treatment system further includes a secondary heat source configured to thaw the reductant within the secondary tank. |
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