Lithographic apparatus and device manufacturing method

An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet...

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Hauptverfasser:	LIEBREGTS PAULUS MARTINUS MARIA, STEFFENS KOEN, HAM RONALD VAN DER, VERSTRAETE JORIS JOHAN, SPRUYTENBURG PATRICK JOHANNES, JANSSEN FRANCISCUS JOHANNES JOSEPH, DE GRAAF ROELOF FREDERIK, SIMONS WILHELMUS FRANCISCUS, MIRANDA MARCIO ALEXANDRE CANO, BERKVENS PAUL PETRUS JOANNES, DIRECKS DANIEL JOZEF MARIA, LIEROP MATHIEUS ANNA KAREL VAN, METSENAERE CHRISTOPHE DE, SCHOLTES-VAN EIJK PAUL WILLIAM, BRANDS GERT-JAN GERARDUS, LEMPENS HAN HENRICUS ALDEGONDA
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY PHOTOGRAPHY PHYSICS
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Beschreibung
Zusammenfassung:	An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.