INTEGRATED DEVICE

A method of fabricating an integrated device on a substrate with an exposed surface region is disclosed. One embodiment provides introducing a first component into the exposed surface region of the substrate. A material is provided on the exposed surface region. The material on the exposed surface r...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HAYN REGINA, PETHE WIELAND, STORBECK OLAF, STOPFORD PHILIP, MOLL HANS-PETER, HEIDEMEYER HENRY
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method of fabricating an integrated device on a substrate with an exposed surface region is disclosed. One embodiment provides introducing a first component into the exposed surface region of the substrate. A material is provided on the exposed surface region. The material on the exposed surface region is cured and the first component release from the exposed surface region of the substrate.