PHOTOSENSITIVE LAYER STACK

A photosensitive layer stack and methods for multiple exposure lithography are disclosed having a bleachable layer with a first absorption switching from absorptive to transmissive upon irradiation and a photochromic layer having a second absorption switching from transmissive to absorptive upon irr...

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1. Verfasser: PFORR RAINER
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A photosensitive layer stack and methods for multiple exposure lithography are disclosed having a bleachable layer with a first absorption switching from absorptive to transmissive upon irradiation and a photochromic layer having a second absorption switching from transmissive to absorptive upon irradiation.