MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

A measurement apparatus comprises a polarization controller (2) which controls polarization of light which is incident on a detection target; a wavefront dividing unit (5) which divides a wavefront of the light from the polarization controller (2); a polarizing unit (6, 7) which polarizes the light transmitted through the target; a detector (8) which detects the light transmitted through the wavefront dividing unit and/or the polarizing unit; a processor (13) which calculates the optical characteristics of the target based on a detection result; and a first driving unit which moves the wavefront dividing unit with respect to the detector to position the wavefront dividing unit in or outside an optical path running from the target to the detector. The processor (13) calculates the optical characteristics using detection results obtained when the wavefront dividing unit is positioned in the optical path and obtained when the wavefront dividing unit is positioned outside the optical path.