APPARATUS WITH ENHANCED RESOLUTION FOR MEASURING STRUCTURES ON A SUBSTRATE FOR SEMICONDUCTOR MANUFACTURE AND USE OF APERTURES IN A MEASURING APPARATUS

APPARATUS WITH ENHANCED RESOLUTION FOR MEASURING STRUCTURES ON A SUBSTRATE FOR SEMICONDUCTOR MANUFACTURE AND USE OF APERTURES IN A MEASURING APPARATUS

A measuring system is disclosed with enhanced resolution for periodic structures on a substrate for semiconductor manufacture. Aperture structures of varying geometries are provided in the illumination beam path. The aperture structures differ regarding the transmission characteristics of light, and...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: BOESSER HANS-ARTUR, STEINBERG WALTER
Format: Patent
Sprache:eng
Schlagworte:
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Beschreibung
Zusammenfassung:A measuring system is disclosed with enhanced resolution for periodic structures on a substrate for semiconductor manufacture. Aperture structures of varying geometries are provided in the illumination beam path. The aperture structures differ regarding the transmission characteristics of light, and which adjust the intensity distribution of the diffraction orders in the imaging pupil of the optical system.