Cvd-Reactor with Slidingly Mounted Susceptor Holder

The invention relates to a device for depositing at least one layer on a substrate having one or more susceptors ( 7 ) for receiving substrates, comprising a substrate holder ( 6 ) that can be rotatably driven and forms the bottom of a process chamber ( 2 ), a RF heating system ( 22 ) disposed below...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: FRANKEN WALTER, KAPPELER JOHANNES
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The invention relates to a device for depositing at least one layer on a substrate having one or more susceptors ( 7 ) for receiving substrates, comprising a substrate holder ( 6 ) that can be rotatably driven and forms the bottom of a process chamber ( 2 ), a RF heating system ( 22 ) disposed below the susceptor holder ( 6 ) and a gas inlet element ( 4 ) for introducing process gases into the process chamber. In order to further develop the generic device and to improve the production and advantages of use, it is proposed that the susceptor holder ( 6 ) lies in a sliding manner on an essentially IR- and/or RF-permeable supporting plate ( 14 ).