SELF CLEANING ALUMINUM ALLOY SUBSTRATES
Self-cleaning aluminum alloy substrates and methods of making the same are disclosed. In one embodiment, a substrate is provided, the substrate including an aluminum alloy body, an anodic oxide zone having micropores within a surface of the aluminum alloy body, the anodic oxide zone being substantia...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Self-cleaning aluminum alloy substrates and methods of making the same are disclosed. In one embodiment, a substrate is provided, the substrate including an aluminum alloy body, an anodic oxide zone having micropores within a surface of the aluminum alloy body, the anodic oxide zone being substantially impermeable to contaminants, and a photocatalytic film located on at least a portion of the anodic oxide zone, wherein the photocatalytic film comprises photocatalytically active semiconductor. In one embodiment, a method is provided, the method including the steps of forming an anodic oxide zone in at least a portion of an aluminum alloy base, forming a photocatalytic film, the photocatalytic film being located on the anodic oxide zone, and sealing the anodic oxide zone with a sealant, wherein, as sealed, the anodic oxide zone is substantially impermeable to contaminants. |
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