Semiconductor die for increasing yield and usable wafer area

According to one embodiment, a semiconductor die for increasing usable area of a wafer and for increasing yield has a substantially hexagonal shape. The wafer can have, for example, a circular shape. The semiconductor die can be diced by, for example, using a water-jet-guided laser. In one embodiment, the semiconductor die results in an approximately 2.0% to 4.0% reduction in the unusable area of the wafer. Moreover, the substantially hexagonal shape of the semiconductor die reduces stress at corners of the semiconductor die, thus increasing the yield of the wafer.