METHODS AND SYSTEMS FOR PROCESSING SEMICONDUCTOR WORKPIECES

Methods and systems for processing semiconductor workpieces are disclosed herein. In one embodiment, a method for processing a semiconductor workpiece includes releasably attaching a plurality of microelectronic dies to a first side of a releasable film, and at least partially detaching one of the d...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TAY LIANG CHEE, PUAH KIA HENG
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Methods and systems for processing semiconductor workpieces are disclosed herein. In one embodiment, a method for processing a semiconductor workpiece includes releasably attaching a plurality of microelectronic dies to a first side of a releasable film, and at least partially detaching one of the dies from the releasable film by pivoting a contact member with a surface of the contact member pressing against a second side of the releasable film.