Method and apparatus for highly purifying nitric oxide for semiconductor

There is provided an apparatus for highly purifying nitric oxide by removing impurities included in nitric oxide, which comprises: a number of dehumidifiers connected to one another in a series, to remove water and carbon dioxide from the nitric oxide; a vaporizing and liquefying unit for respectively separating impurities into a gaseous state and a liquid state by cooling the nitric oxide which passed through the dehumidifiers at sub-zero temperatures; a storage tank for storing highly purified nitric oxide separated by the vaporizing and liquefying unit; an exhaust pump for discharging gaseous impurities, separated by the vaporizing and liquefying unit, to a scrubber; an outlet for discharging liquid impurities, separated by the vaporizing and liquefying unit, to the scrubber; and the scrubber 50 for purifying the gaseous and liquid impurities.