Lithographic apparatus, immersion projection apparatus and device manufacturing method

A control system configured to control a position of a fluid supply system, the fluid supply system constructed and arranged to supply a fluid between a substrate and a projection system, the substrate positioned with a substrate stage, the control system including a controller configured to determi...

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Bibliographische Detailangaben
Hauptverfasser:	VAN DER MEULEN FRITS, CUPERUS MINNE, HOUKES MARTIJN, BUTLER HANS, FRENCKEN MARK JOHANNES HERMANUS, ARENDS ANTONIUS HENRICUS, COX HENRIKUS HERMAN MARIE, VAN DER TOORN JAN-GERARD CORNELIS, DRAAIJER EVERT HENDRIK JAN, TEN KATE NICOLAAS
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY PHOTOGRAPHY PHYSICS
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Beschreibung
Zusammenfassung:	A control system configured to control a position of a fluid supply system, the fluid supply system constructed and arranged to supply a fluid between a substrate and a projection system, the substrate positioned with a substrate stage, the control system including a controller configured to determine a desired position of the fluid supply system based on a position signal to be provided to the substrate stage and a position offset, the position offset added to the position signal to be provided to the substrate stage.