METHOD OF FORMING BRANCHED STRUCTURES

The present invention provides a method of forming a branched structure which comprises applying colloidal-sized particles over structures. The coated structures are then etched such that the structures are etched through the colloidal particles to form branched structures. The etch may be a reactiv...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	YI DONG-KEE, SAMPER VICTOR DONALD, KUSTANDI TANU SURYADI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS DECORATIVE ARTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MICROSTRUCTURAL TECHNOLOGY MOSAICS PAPERHANGING PERFORMING OPERATIONS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS PRODUCING DECORATIVE EFFECTS SEMICONDUCTOR DEVICES TARSIA WORK TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention provides a method of forming a branched structure which comprises applying colloidal-sized particles over structures. The coated structures are then etched such that the structures are etched through the colloidal particles to form branched structures. The etch may be a reactive ion etch. The structures may be microstructures formed as high aspect ratio microstructures. The colloidal-sized particles may be applied as a colloidal solution and a polyelectrolyte (PE) layer may be applied to the microstructures prior to the colloidal solution to promote adsorption of the colloidal particles.