Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

In a scatterometric method, a roughness value can be obtained by using a model including a surface layer having a variable parameter relating to its refractive index.

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Bibliographische Detailangaben
Hauptverfasser:	VAENKATESAN VIDYA, MARIE KIERS ANTOINE GASTON, MARIA MELIS PATRICK CHARLES, MARINUS DER KINDEREN THEODORUS LAMBERTUS
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	In a scatterometric method, a roughness value can be obtained by using a model including a surface layer having a variable parameter relating to its refractive index.