SUBSTRATE HANDLING SYSTEM AND METHOD

SUBSTRATE HANDLING SYSTEM AND METHOD

A system and method for handling substrates in a vacuum chamber. The system includes a first robot configured for transferring substrates from a first set of load locks to a preprocessing station, and for transferring substrates from a process platen to the first set of load locks; a second robot co...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: MCLANE JAMES R
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A system and method for handling substrates in a vacuum chamber. The system includes a first robot configured for transferring substrates from a first set of load locks to a preprocessing station, and for transferring substrates from a process platen to the first set of load locks; a second robot configured for transferring substrates from a second set of load locks to the preprocessing station, and for transferring substrates from the process platen to the second set of load locks; and a transfer mechanism for transferring substrates from the preprocessing station to the process platen.