Electrolytic liquid for electrolytic polishing and electrolytic polishing method

An electrolytic liquid is used for electrolytic polishing which can provide a processed surface having high flattening characteristics with a low voltage applied while ensuring a higher processing rate for an conductive material, and can remove an unnecessary conductive material and expose a barrier...

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Bibliographische Detailangaben
Hauptverfasser: KODERA AKIRA, TOMA YASUSHI, KOBATA ITSUKI, SUZUKI TSUKURU, SAITO TAKAYUKI
Format: Patent
Sprache:eng
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Zusammenfassung:An electrolytic liquid is used for electrolytic polishing which can provide a processed surface having high flattening characteristics with a low voltage applied while ensuring a higher processing rate for an conductive material, and can remove an unnecessary conductive material and expose a barrier film without causing dishing, erosion, or etching at the interface between the barrier film and a metal (conductive material). The electrolytic liquid for use in electrolytic polishing of a surface conductive material of a workpiece comprises an aqueous solution containing at least one organic acid or its salt, at least one strong acid having a sulfonic acid group, a corrosion inhibitor and a water-soluble polymeric compound.