Molecular glass photoresists

Several small molecule, molecular glasses are disclosed with new architectures designed for use as photoresists in semiconductor lithography. The disclosed photoresists are low molecular weight organic materials that demonstrate a glass transition temperature significantly above room temperature as...

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Hauptverfasser: FORMAN DREW C, DE SILVA EKMINI ANUJA, OBER CHRISTOPHER K
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creator FORMAN DREW C
DE SILVA EKMINI ANUJA
OBER CHRISTOPHER K
description Several small molecule, molecular glasses are disclosed with new architectures designed for use as photoresists in semiconductor lithography. The disclosed photoresists are low molecular weight organic materials that demonstrate a glass transition temperature significantly above room temperature as well as a low tendency towards crystallization. The molecular glass photoresists have a tetrahedral silane molecular core with four phenyl groups or four biphenyl groups. Each phenyl group or each outer phenyl group of a biphenyl group has a methoxy or hydroxy group at the 3- or 4-position. For the biphenyl embodiments, the linkage may be meta-meta, meta-para, para-para or para-meta.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2008044757A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2008044757A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2008044757A13</originalsourceid><addsrcrecordid>eNrjZJDxzc9JTS7NSSxSSM9JLC5WKMjIL8kvSi3OLC4p5mFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8aHBRgYGFgYmJuam5o6GxsSpAgBgSSU2</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Molecular glass photoresists</title><source>esp@cenet</source><creator>FORMAN DREW C ; DE SILVA EKMINI ANUJA ; OBER CHRISTOPHER K</creator><creatorcontrib>FORMAN DREW C ; DE SILVA EKMINI ANUJA ; OBER CHRISTOPHER K</creatorcontrib><description>Several small molecule, molecular glasses are disclosed with new architectures designed for use as photoresists in semiconductor lithography. The disclosed photoresists are low molecular weight organic materials that demonstrate a glass transition temperature significantly above room temperature as well as a low tendency towards crystallization. The molecular glass photoresists have a tetrahedral silane molecular core with four phenyl groups or four biphenyl groups. Each phenyl group or each outer phenyl group of a biphenyl group has a methoxy or hydroxy group at the 3- or 4-position. For the biphenyl embodiments, the linkage may be meta-meta, meta-para, para-para or para-meta.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; AUXILIARY PROCESSES IN PHOTOGRAPHY ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES ; PHYSICS</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080221&amp;DB=EPODOC&amp;CC=US&amp;NR=2008044757A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080221&amp;DB=EPODOC&amp;CC=US&amp;NR=2008044757A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FORMAN DREW C</creatorcontrib><creatorcontrib>DE SILVA EKMINI ANUJA</creatorcontrib><creatorcontrib>OBER CHRISTOPHER K</creatorcontrib><title>Molecular glass photoresists</title><description>Several small molecule, molecular glasses are disclosed with new architectures designed for use as photoresists in semiconductor lithography. The disclosed photoresists are low molecular weight organic materials that demonstrate a glass transition temperature significantly above room temperature as well as a low tendency towards crystallization. The molecular glass photoresists have a tetrahedral silane molecular core with four phenyl groups or four biphenyl groups. Each phenyl group or each outer phenyl group of a biphenyl group has a methoxy or hydroxy group at the 3- or 4-position. For the biphenyl embodiments, the linkage may be meta-meta, meta-para, para-para or para-meta.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>AUXILIARY PROCESSES IN PHOTOGRAPHY</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJDxzc9JTS7NSSxSSM9JLC5WKMjIL8kvSi3OLC4p5mFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8aHBRgYGFgYmJuam5o6GxsSpAgBgSSU2</recordid><startdate>20080221</startdate><enddate>20080221</enddate><creator>FORMAN DREW C</creator><creator>DE SILVA EKMINI ANUJA</creator><creator>OBER CHRISTOPHER K</creator><scope>EVB</scope></search><sort><creationdate>20080221</creationdate><title>Molecular glass photoresists</title><author>FORMAN DREW C ; DE SILVA EKMINI ANUJA ; OBER CHRISTOPHER K</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2008044757A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2008</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>AUXILIARY PROCESSES IN PHOTOGRAPHY</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>FORMAN DREW C</creatorcontrib><creatorcontrib>DE SILVA EKMINI ANUJA</creatorcontrib><creatorcontrib>OBER CHRISTOPHER K</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FORMAN DREW C</au><au>DE SILVA EKMINI ANUJA</au><au>OBER CHRISTOPHER K</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Molecular glass photoresists</title><date>2008-02-21</date><risdate>2008</risdate><abstract>Several small molecule, molecular glasses are disclosed with new architectures designed for use as photoresists in semiconductor lithography. The disclosed photoresists are low molecular weight organic materials that demonstrate a glass transition temperature significantly above room temperature as well as a low tendency towards crystallization. The molecular glass photoresists have a tetrahedral silane molecular core with four phenyl groups or four biphenyl groups. Each phenyl group or each outer phenyl group of a biphenyl group has a methoxy or hydroxy group at the 3- or 4-position. For the biphenyl embodiments, the linkage may be meta-meta, meta-para, para-para or para-meta.</abstract><oa>free_for_read</oa></addata></record>
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source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
AUXILIARY PROCESSES IN PHOTOGRAPHY
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES
PHYSICS
title Molecular glass photoresists
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-10T19%3A52%3A25IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=FORMAN%20DREW%20C&rft.date=2008-02-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2008044757A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true