Molecular glass photoresists

Several small molecule, molecular glasses are disclosed with new architectures designed for use as photoresists in semiconductor lithography. The disclosed photoresists are low molecular weight organic materials that demonstrate a glass transition temperature significantly above room temperature as...

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Bibliographische Detailangaben
Hauptverfasser:	FORMAN DREW C, DE SILVA EKMINI ANUJA, OBER CHRISTOPHER K
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS
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Beschreibung
Zusammenfassung:	Several small molecule, molecular glasses are disclosed with new architectures designed for use as photoresists in semiconductor lithography. The disclosed photoresists are low molecular weight organic materials that demonstrate a glass transition temperature significantly above room temperature as well as a low tendency towards crystallization. The molecular glass photoresists have a tetrahedral silane molecular core with four phenyl groups or four biphenyl groups. Each phenyl group or each outer phenyl group of a biphenyl group has a methoxy or hydroxy group at the 3- or 4-position. For the biphenyl embodiments, the linkage may be meta-meta, meta-para, para-para or para-meta.