PHOTOMASK HAVING HAZE REDUCTION LAYER

A photomask is fabricated to have a patterned surface and a transparent layer formed on the patterned surface.

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Bibliographische Detailangaben
Hauptverfasser:	HO MING-TAO, LIN JIIN-HONG, HU CHIN-WANG
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMICAL SURFACE TREATMENT CHEMISTRY CINEMATOGRAPHY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONVERSION OF CHEMICAL ELEMENTS DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTROGRAPHY ELECTROTHERAPY HOLOGRAPHY HUMAN NECESSITIES HYGIENE INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MAGNETOTHERAPY MATERIALS THEREFOR MEDICAL OR VETERINARY SCIENCE METALLURGY NUCLEAR ENGINEERING NUCLEAR PHYSICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RADIATION THERAPY RADIOACTIVE SOURCES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ULTRASOUND THERAPY
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Beschreibung
Zusammenfassung:	A photomask is fabricated to have a patterned surface and a transparent layer formed on the patterned surface.