Stannane Gas Supply System

To provide a stannane gas supply system capable of supplying a stannane gas to an extreme ultraviolet ray radiation source with a stable flow rate. A stannane gas supply system for supplying a stannane gas to an extreme ultraviolet ray radiation source characterized by comprising a sealed container...

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Bibliographische Detailangaben
1. Verfasser: TARUTANI KOHEI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:To provide a stannane gas supply system capable of supplying a stannane gas to an extreme ultraviolet ray radiation source with a stable flow rate. A stannane gas supply system for supplying a stannane gas to an extreme ultraviolet ray radiation source characterized by comprising a sealed container for storing a mixture of a stannane liquid and a stannane gas, connected with the extreme ultraviolet ray radiation source via a pipe, cooling means for cooling the sealed container to a temperature lower than -60° C., a low pressure mass flow controller provided in the pipe, a pressure detecting device mounted in the pipe part disposed between the sealed container and the low pressure mass flow controller, for detecting the pressure of the stannane gas in the pipe part, and controlling means for controlling the cooling degree of the sealed container by the cooling means based on the pressure detection value by the pressure detecting device.