TANTALUM AND NIOBIUM COMPOUNDS AND THEIR USE FOR CHEMICAL VAPOUR DEPOSITION (CVD)

The present invention relates to special, novel tantalum and niobium compounds, the use thereof for the deposition of tantalum- or niobium-containing layers by means of chemical vapour deposition and the tantalum- or niobium-containing layers produced by this process.

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Bibliographische Detailangaben
Hauptverfasser: SUNDERMEYER JORG, VOLZ KERSTIN, KIRCHMEYER STEPHAN, GAESS DANIEL, OCHS THOMAS, POKOJ MICHAEL, REUTER KNUD, STOLZ WOLFGANG
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention relates to special, novel tantalum and niobium compounds, the use thereof for the deposition of tantalum- or niobium-containing layers by means of chemical vapour deposition and the tantalum- or niobium-containing layers produced by this process.