MEASURING DEVICE OF AN HF PLASMA SYSTEM

A measuring device of an HF plasma system includes an uncoupling device for uncoupling one or a plurality of signals related to a power and at least one filter arrangement to which such a signal is transmitted. The filter arrangement is designed as a band pass filter arrangement and includes a first...

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Bibliographische Detailangaben
Hauptverfasser:	GERHARDT CHRISTOPH, RIESSLE PETER, KRAUSSE DANIEL
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC COMMUNICATION TECHNIQUE ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY MEASURING MEASURING ELECTRIC VARIABLES MEASURING MAGNETIC VARIABLES PHYSICS TESTING TRANSMISSION
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Beschreibung
Zusammenfassung:	A measuring device of an HF plasma system includes an uncoupling device for uncoupling one or a plurality of signals related to a power and at least one filter arrangement to which such a signal is transmitted. The filter arrangement is designed as a band pass filter arrangement and includes a first and a second filter element between which a decoupling device is arranged.