Surfactant

A compound of the formula R1. [(AO)n.-R2]m (I) where: R1 is the residue of a group having at least m active hydrogen atoms; AO is an alkylene oxide residue; each n is independently from 1 to 100; m is at least 2; and each R2 is independently H, a C1 to C2, hydrocarbyl, or an acyl group -OC.R3, where...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MCNAMEE WILLIAM H, BLEASE TREVOR G, GRADE JOHNT D, BEVINAKATTI HANAMANTHSA S
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A compound of the formula R1. [(AO)n.-R2]m (I) where: R1 is the residue of a group having at least m active hydrogen atoms; AO is an alkylene oxide residue; each n is independently from 1 to 100; m is at least 2; and each R2 is independently H, a C1 to C2, hydrocarbyl, or an acyl group -OC.R3, where R3 is a C1 to C21 hydrocarbyl group, wherein on average greater than one of the R2 groups is or comprises a C4 to C21 hydrocarbyl group comprising at least two ethylenic double bonds. The compounds are particularly suitable for use in preparing aqueous emulsions or dispersions of resins and polymers, especially alkyd resins.