HEATING ELEMENT FOR MICROFLUIDIC AND MICROMECHANICAL APPLICATIONS

An integrated heater formed as a field effect transistor in a semiconductor substrate, with the transistor having source and drain regions with a channel region extending therebetween to conduct current. The channel region has a resistance when conducting current to generate heat above a selected th...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	LO PRIORE STEFANO, SANTORUVO GAETANO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CORRECTION OF TYPOGRAPHICAL ERRORS ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY FLUID-CIRCUIT ELEMENTS PREDOMINANTLY USED FOR COMPUTING ORCONTROL PURPOSES FLUID-PRESSURE ACTUATORS HEATING HYDRAULICS OR PNEUMATICS IN GENERAL i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME LIGHTING LINING MACHINES MECHANICAL ENGINEERING MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES MICROSTRUCTURAL TECHNOLOGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PRINTING SELECTIVE PRINTING MECHANISMS SEMICONDUCTOR DEVICES STAMPS THEIR RELEVANT APPARATUS TRANSPORTING TYPEWRITERS WEAPONS
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Beschreibung
Zusammenfassung:	An integrated heater formed as a field effect transistor in a semiconductor substrate, with the transistor having source and drain regions with a channel region extending therebetween to conduct current. The channel region has a resistance when conducting current to generate heat above a selected threshold. A dielectric layer is disposed on the channel region and a gate electrode is disposed on the dielectric layer to control the current of the channel region. A thermally insulating barrier is formed in the semiconductor material and may extend about the transistor. The object to be heated is positioned to receive the heat generated by the resistance of the channel region; the object may be a fluid chamber.