Analysis of a reactive gas such as silane for particle generating impurities

An improved process for supplying to a processing apparatus a gas containing at least one impurity that reacts and/or nucleates to form contaminating particles suspended in the gas is disclosed. The improvement includes sampling a flow of the gas upstream of the processing apparatus with a particle...

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Bibliographische Detailangaben
Hauptverfasser:	MAROULIS PETER J, KETKAR SUHAS N, MCDERMOTT WAYNE T
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PHYSICS SEPARATION SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TESTING TRANSPORTING
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Beschreibung
Zusammenfassung:	An improved process for supplying to a processing apparatus a gas containing at least one impurity that reacts and/or nucleates to form contaminating particles suspended in the gas is disclosed. The improvement includes sampling a flow of the gas upstream of the processing apparatus with a particle counter and/or particle capture filter to detect an amount of the contaminating particles in the flow of the gas, and generating a signal when the amount of particles is in excess of a predetermined amount. An apparatus for performing the process includes: a supply source; at least one processing tool; a particle counter upstream of the processing tool and downstream of the supply source; a microprocessor in electrical communication with at least the particle counter; and optionally a particle capture filter in parallel with the particle counter. The process and apparatus are useful in the manufacture of integrated circuits.