SYSTEMS AND METHODS FOR CREATING MEMS GYROS

Methods and systems for creating microelectromechanical system (MEMS) gyros. The methods and systems include generating a map of motor bias and creating MEMS gyros based on the map of motor bias to achieve a higher yield of usable MEMS gyros per wafer. The systems include a processor with components...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	DWYER PAUL W, COUSSEAU PETER L
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GYROSCOPIC INSTRUMENTS MEASURING MEASURING DISTANCES, LEVELS OR BEARINGS MICROSTRUCTURAL TECHNOLOGY NAVIGATION PERFORMING OPERATIONS PHOTOGRAMMETRY OR VIDEOGRAMMETRY PHYSICS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS SEMICONDUCTOR DEVICES SURVEYING TESTING TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	Methods and systems for creating microelectromechanical system (MEMS) gyros. The methods and systems include generating a map of motor bias and creating MEMS gyros based on the map of motor bias to achieve a higher yield of usable MEMS gyros per wafer. The systems include a processor with components configured to determine paths of optimal motor bias for a given deep reactive ion etcher on a wafer, a stepper for imprinting a pattern for each gyro in an orientation that corresponds to the path of optimal motor bias each gyro is calculated to be most near on the wafer, and a deep reactive ion etcher to etch the gyros in the wafer.