Apparatus and method for high utilization of process chambers of a cluster system through staggered plasma cleaning

Apparatus and method for high utilization of process chambers of a cluster system through staggered plasma cleaning

A method for processing a plurality of substrates in a processing system having four or more process chambers is provided. Each substrate is processed in at least four of the four or more process chambers. Each of the four or more process chambers is cleaned after processing fifteen or less substrat...

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Hauptverfasser: TAKEHARA TAKAKO, HUANG INCHEN, WHITE JOHN M
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Sprache:eng
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CLEANING
CLEANING IN GENERAL
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PLASMA TECHNIQUE
PREVENTION OF FOULING IN GENERAL
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
TRANSPORTING
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creator TAKEHARA TAKAKO
HUANG INCHEN
WHITE JOHN M
description A method for processing a plurality of substrates in a processing system having four or more process chambers is provided. Each substrate is processed in at least four of the four or more process chambers. Each of the four or more process chambers is cleaned after processing fifteen or less substrates, wherein cleaning of each chamber is scheduled at distinct, non-overlapping time periods to enhance throughput of the substrates through the processing system.
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subjects CLEANING
CLEANING IN GENERAL
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PLASMA TECHNIQUE
PREVENTION OF FOULING IN GENERAL
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
TRANSPORTING
title Apparatus and method for high utilization of process chambers of a cluster system through staggered plasma cleaning
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