Device, lithographic apparatus and device manufacturing method

A device for locally treating a substrate is disclosed. The device includes an enclosure for forming an enclosed environment at a location on the substrate, a seal for sealing the enclosed environment between the enclosure and the substrate, a supply channel for supplying a chemical reactant to the...

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Bibliographische Detailangaben
Hauptverfasser: VAN ZEIJL HENDRIKUS WILHELMUS, PELLENS RUDY JAN MARIA, KRIKHAAR JOHANNES WILHELMUS MARIA, MEESTER ARNOUT JOHANNES
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A device for locally treating a substrate is disclosed. The device includes an enclosure for forming an enclosed environment at a location on the substrate, a seal for sealing the enclosed environment between the enclosure and the substrate, a supply channel for supplying a chemical reactant to the location, and a removal channel for removing a chemical from the enclosed environment.