FACETED MIRROR APPARATUS

In a method for the production of a facetted mirror 24 having a plurality of mirror facets 12 and 12 ', which have mirror surfaces 15 and are fitted into reception bores 22, 22 ' of a support plate 16, the mirror facets 12, 12 ' are made in a first method step. At least one of the mir...

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Bibliographische Detailangaben
Hauptverfasser:	HEISLER ANDREAS, SEIFERT ANDREAS, DORNHEIM STEFAN, WEISS MARKUS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	In a method for the production of a facetted mirror 24 having a plurality of mirror facets 12 and 12 ', which have mirror surfaces 15 and are fitted into reception bores 22, 22 ' of a support plate 16, the mirror facets 12, 12 ' are made in a first method step. At least one of the mirror facets is fitted into the associated reception bore of the support plate in a second method step, after which the ACTUAL position of the optical axis of at least one mirror surface of an associated mirror facet 12, 12 ' fitted into the support plate is respectively determined in a third step and compared with a SET position of a predetermined optical axis. Knowing the measured values determined for the at least one mirror facet 12, 12 ' in the third method step, reprocessing of the mirror facet and/or of the reception bore is subsequently carried out in a further method step if there is an angular deviation between the ACTUAL position and the SET position.