Process For Preparing A Polymeric Relief Structure

The invention deals with a process for the preparation of a polymeric relief structure via electromagnetic radiation. In the process a compound is used that reduces the interfacial tension of the coated substrate. As a result the aspect ratio as well as the curvature of the surface are enhanced, and...

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Bibliographische Detailangaben
Hauptverfasser:	BROER DICK, BASTIAANSEN CORNELIS, SANCHEZ CARLOS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY ELECTROPHOTOGRAPHY HOLOGRAPHY MAGNETOGRAPHY MATERIALS THEREFOR MICROSTRUCTURAL TECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS TRANSPORTING
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Beschreibung
Zusammenfassung:	The invention deals with a process for the preparation of a polymeric relief structure via electromagnetic radiation. In the process a compound is used that reduces the interfacial tension of the coated substrate. As a result the aspect ratio as well as the curvature of the surface are enhanced, and therefore are beneficial for optical components and for replication purposes.