SUBSTRATE SUPPORT HAVING HEAT TRANSFER SYSTEM

A support for a substrate processing chamber comprises a fluid circulating reservoir comprising a channel having serpentine convolutions. A fluid inlet supplies a heat transfer fluid to the fluid circulating reservoir and a fluid outlet discharges the heat transfer fluid. In one version, the channel...

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Bibliographische Detailangaben
Hauptverfasser: LUE BRIAN C, CHENG WING L, HOFFMAN DANIEL J, YE YAN, KATS SEMYON L, WONG KWOK M, ISHIKAWA TETSUYA, HANAWA HIROJI, RAMASWAMY KARTIK, NGUYEN ANDREW
Format: Patent
Sprache:eng
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Zusammenfassung:A support for a substrate processing chamber comprises a fluid circulating reservoir comprising a channel having serpentine convolutions. A fluid inlet supplies a heat transfer fluid to the fluid circulating reservoir and a fluid outlet discharges the heat transfer fluid. In one version, the channel is doubled over to turn back upon itself.