Method for charging substrate to a potential

A surface of an insulating substrate is charged to a target potential. In one embodiment, the surface is flooded with a higher-energy electron beam such that the electron yield is greater than one. Subsequently, the surface is flooded with a lower-energy electron beam such that the electron yield is...

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Bibliographische Detailangaben
Hauptverfasser:	BERTSCHE KIRK J, MCCORD MARK A
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY ELECTROTHERAPY GAMMA RAY OR X-RAY MICROSCOPES HUMAN NECESSITIES HYGIENE IRRADIATION DEVICES MAGNETOTHERAPY MEDICAL OR VETERINARY SCIENCE NUCLEAR ENGINEERING NUCLEAR PHYSICS PHYSICS RADIATION THERAPY TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR ULTRASOUND THERAPY
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Beschreibung
Zusammenfassung:	A surface of an insulating substrate is charged to a target potential. In one embodiment, the surface is flooded with a higher-energy electron beam such that the electron yield is greater than one. Subsequently, the surface is flooded with a lower-energy electron beam such that the electron yield is less than one. In another embodiment, the substrate is provided with the surface in a state at an approximate initial potential above the target potential. The surface is then flooded with charged particle such that the charge yield of scattered particles is less than one, such that a steady state is reached at which the target potential is achieved. Another embodiment pertains to an apparatus for charging a surface of an insulating substrate to a target potential.