Method and system to define multiple metrology criteria for defect screening of electrical connections

Method and system to define multiple metrology criteria for defect screening of electrical connections

A method and system for defining multiple metrological criteria for the screening of defects of electrical connections, such as controlled collapse chip connections (C4s). Moreover, the method and system defines the multiple metrology criteria or the defect screening of C4s in which the C4 minimum s...

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Bibliographische Detailangaben
1. Verfasser: NEARY TIMOTHY E
Format: Patent
Sprache:eng
Schlagworte:
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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Beschreibung
Zusammenfassung:A method and system for defining multiple metrological criteria for the screening of defects of electrical connections, such as controlled collapse chip connections (C4s). Moreover, the method and system defines the multiple metrology criteria or the defect screening of C4s in which the C4 minimum spacing in critical regions is measured at different criteria in comparison with criteria which is employed for more widely spaced apart C4s located in isolated areas.