Method for reducing the surface roughness of a thin layer of conductive oxides
A method for reducing the surface roughness of thin layers of conductive oxides for thin-layer opto-electronic devices envisages polishing with a finishing cloth and an abrasive compound, which has a basic pH and contains silica particles.
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | A method for reducing the surface roughness of thin layers of conductive oxides for thin-layer opto-electronic devices envisages polishing with a finishing cloth and an abrasive compound, which has a basic pH and contains silica particles. |
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