Method for reducing the surface roughness of a thin layer of conductive oxides

A method for reducing the surface roughness of thin layers of conductive oxides for thin-layer opto-electronic devices envisages polishing with a finishing cloth and an abrasive compound, which has a basic pH and contains silica particles.

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Bibliographische Detailangaben
Hauptverfasser: VIRGILI DALIA, FATTORI VALERIA, COCCHI MASSIMO, GIRO GABRIELE, GARULLI ALBERTO, DI MARCO PIERGIULIO
Format: Patent
Sprache:eng
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Zusammenfassung:A method for reducing the surface roughness of thin layers of conductive oxides for thin-layer opto-electronic devices envisages polishing with a finishing cloth and an abrasive compound, which has a basic pH and contains silica particles.