Method and apparatus for orthopedic implant assessment

Methods and apparatus are described for orthopedic implant assessment. A method includes characterizing wear of an orthopedic implant including measuring a dimension in a direction that defines a path that passes through an articulating surface of a wear element of the orthopedic implant using at le...

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Bibliographische Detailangaben
Hauptverfasser: BABA JUSTIN S, WARMACK ROBERT J, ERICSON MILTON N, BRITTON CHARLES L
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Methods and apparatus are described for orthopedic implant assessment. A method includes characterizing wear of an orthopedic implant including measuring a dimension in a direction that defines a path that passes through an articulating surface of a wear element of the orthopedic implant using at least one thickness sensor. An apparatus includes an orthopedic implant including a wear element having an articulating surface; and at least one thickness sensor coupled to the wear element, the at least one thickness sensor measuring a dimension in a direction that defines a path that passes through the articulating surface of the wear element. A method includes characterizing forces within an orthopedic implant including using a plurality of individually addressable pressure sensors including measuring parasitic impedance between at least two of the plurality of individually addressable pressure sensors.