Contact assembly cleaning in an electrochemical mechanical processing apparatus

Embodiments of the invention generally provide a method and apparatus for cleaning an electrical contact in an electrochemical mechanical planarizing apparatus. In one embodiment, a method for cleaning a contact assembly in an electroprocessing apparatus includes the steps of draining electrolyte fr...

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Bibliographische Detailangaben
Hauptverfasser: DUBOUST ALAIN, MARTINEZ RICARDO, MANENS ANTOINE P, BUTTERFIELD PAUL D, SALAS-VERNIS JOSE, WANG YAN
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Embodiments of the invention generally provide a method and apparatus for cleaning an electrical contact in an electrochemical mechanical planarizing apparatus. In one embodiment, a method for cleaning a contact assembly in an electroprocessing apparatus includes the steps of draining electrolyte from the contact assembly and flowing a rinsing fluid into the contact assembly. In another embodiment, a method for cleaning a contact assembly in an electroprocessing apparatus includes the steps of preventing fluid from passing between an interface of the contact assembly and a pad disposed outward thereof, flowing a rinsing fluid into the contact assembly and draining fluid flowing out of the contact assembly.